硅片,抛光硅片,硅片价格,晶圆,碳化硅,砷化镓,晶片蓝宝石,硅衬底,SOI硅片,N型硅片,P型硅片,硅片厂家,氧化硅片,薄硅片,厚硅片,区熔硅片,锗晶片,外延硅片,直拉硅片,单晶硅片,铌酸锂,LN,钽酸锂,LT,silicon wafers, silicon, silicon slices, prime silicon wafers, test silicon wafers, particle monitor silicon wafers, furnace silicon wafers, mechanical silicon wafers, silicon wafer processing, silicon wafer servicessilicon wafers, silicon, silicon slices, prime silicon wafers, test silicon wafers, particle monitor silicon wafers, furnace silicon wafers, mechanical silicon wafers, silicon wafer processing, silicon wafer servicessilicon wafers, silicon, silicon slices, prime silicon wafers, test silicon wafers, particle monitor silicon wafers, furnace silicon wafers, mechanical silicon wafers, silicon wafer processing, silicon wafer servicessilicon wafers, silicon, silicon slices, prime silicon wafers, test silicon wafers, particle monitor silicon wafers, furnace silicon wafers, mechanical silicon wafers, silicon wafer processing, silicon wafer services, CRYSTALS, BaB2O4, BaF2, CaF2, LiF, MgF2, KBr, KCl, NaCl, CsI, CaCO3, KRS-5, KRS-6, KDP, KTP, PbMoO4, LiIO3, LiNbO3, Quartz, Sapphire, Scintillators, TeO2, TiO2, Rutile, ZnSe, Thermal Oxide, PSG/BPSG, Plasma Nitride, Polysilicon, Photolithography, Epitaxy, Metals, Photo Resist Coating, LPCVD Silicon Nitride, Plasma Oxide, TEOS Oxide, LTO,wafer fabrication,sic wafer,gaas wafer,dummy wafer,soi wafer,glass wafer,semiconductor wafer,silicon oxide,si wafer,quartz wafer,silicon,silicon nitride,epi wafer,silicon on insulator,polished wafer,monocrystalline silicon,semiconductor manufacturing,silicon wafer price,硅片,抛光硅片,硅片价格,晶圆,碳化硅晶片,砷化镓晶片,晶片蓝宝石,硅衬底,SOI硅片,N型硅片,P型硅片,硅片厂家,氧化硅片,薄硅片,厚硅片,区熔硅片,锗晶片,外延硅片,直拉硅片


Item	Dimeter	Type/dopant	Orientaion	crystal struction	wavefront distortion	Parallelism	Reflectivity	dopant element concentration	Flatness	Surface/Roughness	Geometric parameter
GGG	25.4mm 50.8mm 76.5mm 100mm	Intrinsic	<100><110><111>	cubic	≤0.15入/25mm	10 arc sec	1.95	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Nd:GGG)	25.4mm 50.8mm 76.5mm 100mm	Nd(钕)	<100><110><111>	cubic	≤0.15入/25mm	10 arc sec	1.95	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Yb:GGG)	25.4mm 50.8mm 76.5mm 100mm	镱(Yb)	<100><110><111>	cubic	≤0.15入/25mm	10 arc sec	1.95	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
YAG	25.4mm 50.8mm 76.5mm 100mm	Intrinsic	<100><110><111>	cubic	≤0.125入/25mm	10 arc sec	1.82	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Nd:YAG )	25.4mm 50.8mm 76.5mm 100mm	Nd(钕)	<100><110><111>	cubic	≤0.125入/25mm	10 arc sec	1.82	0.5~1.2(±0.1)atm%	N/A 16mm 22.5mm 32.5mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Er:YAG )	25.4mm 50.8mm 76.5mm 100mm	Er	<100><110><111>	cubic	≤0.125入/25mm	10 arc sec	1.82	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Yb:YAG )	25.4mm 50.8mm 76.5mm 100mm	镱(Yb)	<100><110><111>	cubic	≤0.125入/25mm	10 arc sec	1.82	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
YVO4	25.4mm 50.8mm 76.5mm 100mm	Intrinsic	<100><110><111>	cubic	≤0.25入/25mm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Nd:YVO4)	25.4mm 50.8mm 76.5mm 100mm	Nd(钕)	<100><110><111>	Tetragonal	≤0.25入/25mm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Er:YVO4)	25.4mm 50.8mm 76.5mm 100mm	Er	<100><110><111>	Tetragonal	≤0.25入/25mm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
(Yb:YVO4)	25.4mm 50.8mm 76.5mm 100mm	镱(Yb)	<100><110><111>	Tetragonal	≤0.25入/25mm	10 arc sec	2.5	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
磷酸钛氧钾(KTP)	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	Monoclinic	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
KDP(KH2 PO4)	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	Monoclinic	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
Lithium Triborate (LiB3O5 , LBO)	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	Tetragonal	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
Beta-Barium Borate (β-BaB2O4,BBO)	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	Tetragonal	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
BiB3O6 (BIBO)	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	Tetragonal	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
BiB3O6 (BIBO)	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	Tetragonal	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
钛宝石(Ti:sappire）红宝石(Cr:sappire	25.4mm 50.8mm 76.5mm 100mm	Ti/Cr	C A M cut	Tetragonal	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
Yb:KGd(WO4)	25.4mm 50.8mm 76.5mm 100mm	镱(Yb)	X Y Z cut	Tetragonal	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
Nd:KGd(WO4)	25.4mm 50.8mm 76.5mm 100mm	Nd(钕)	X Y Z cut	Tetragonal	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
三硼酸锂（LBO）偏硼酸钡（BBO）	25.4mm 50.8mm 76.5mm 100mm		X Y Z cut	Tetragonal	> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
TSAG	25.4mm 50.8mm 76.5mm 100mm				> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um
TGG(铽镓石榴石	25.4mm 50.8mm 76.5mm 100mm				> λ/8 @ 633 nm	10 arc sec	2.1	0.5~1.2(±0.1)atm%	< λ/10 @ 632.8 nm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

GGG

25.4mm 50.8mm 76.5mm 100mm

Intrinsic

<100><110><111>

cubic

≤0.15入/25mm

10 arc sec

1.95

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Nd:GGG)

25.4mm 50.8mm 76.5mm 100mm

Nd(钕)

<100><110><111>

cubic

≤0.15入/25mm

10 arc sec

1.95

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Yb:GGG)

25.4mm 50.8mm 76.5mm 100mm

镱(Yb)

<100><110><111>

cubic

≤0.15入/25mm

10 arc sec

1.95

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

YAG

25.4mm 50.8mm 76.5mm 100mm

Intrinsic

<100><110><111>

cubic

≤0.125入/25mm

10 arc sec

1.82

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Nd:YAG )

25.4mm 50.8mm 76.5mm 100mm

Nd(钕)

<100><110><111>

cubic

≤0.125入/25mm

10 arc sec

1.82

0.5~1.2(±0.1)atm%

N/A 16mm 22.5mm 32.5mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Er:YAG )

25.4mm 50.8mm 76.5mm 100mm

Er

<100><110><111>

cubic

≤0.125入/25mm

10 arc sec

1.82

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Yb:YAG )

25.4mm 50.8mm 76.5mm 100mm

镱(Yb)

<100><110><111>

cubic

≤0.125入/25mm

10 arc sec

1.82

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

YVO4

25.4mm 50.8mm 76.5mm 100mm

Intrinsic

<100><110><111>

cubic

≤0.25入/25mm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Nd:YVO4)

25.4mm 50.8mm 76.5mm 100mm

Nd(钕)

<100><110><111>

Tetragonal

≤0.25入/25mm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Er:YVO4)

25.4mm 50.8mm 76.5mm 100mm

Er

<100><110><111>

Tetragonal

≤0.25入/25mm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(Yb:YVO4)

25.4mm 50.8mm 76.5mm 100mm

镱(Yb)

<100><110><111>

Tetragonal

≤0.25入/25mm

10 arc sec

2.5

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

磷酸钛氧钾(KTP)

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

Monoclinic

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

KDP(KH2 PO4)

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

Monoclinic

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

Lithium Triborate (LiB3O5 , LBO)

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

Tetragonal

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

Beta-Barium Borate (β-BaB2O4,BBO)

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

Tetragonal

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

BiB3O6 (BIBO)

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

Tetragonal

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

BiB3O6 (BIBO)

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

Tetragonal

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

钛宝石(Ti:sappire）
红宝石(Cr:sappire

25.4mm 50.8mm 76.5mm 100mm

Ti/Cr

C A M cut

Tetragonal

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

Yb:KGd(WO4)

25.4mm 50.8mm 76.5mm 100mm

镱(Yb)

X Y Z cut

Tetragonal

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

Nd:KGd(WO4)

25.4mm 50.8mm 76.5mm 100mm

Nd(钕)

X Y Z cut

Tetragonal

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

三硼酸锂（LBO）偏硼酸钡（BBO）

25.4mm 50.8mm 76.5mm 100mm

X Y Z cut

Tetragonal

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

TSAG

25.4mm 50.8mm 76.5mm 100mm

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

TGG(铽镓石榴石

25.4mm 50.8mm 76.5mm 100mm

> λ/8 @ 633 nm

10 arc sec

2.1

0.5~1.2(±0.1)atm%

< λ/10 @ 632.8 nm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um

(钆镓石榴石GGG) (钇铝石榴石YAG) 钒酸钇(YVO4) 钒酸钆（YVO4）磷酸氧钛钾（KTP）三硼酸锂（LBO）偏硼酸钡（BBO） KTP(磷酸氧钛钾)激光晶体 Wafer

Contact info

Specification for (钆镓石榴石GGG) (钇铝石榴石YAG) 钒酸钇(YVO4) 钒酸钆（YVO4）磷酸氧钛钾（KTP）三硼酸锂（LBO）偏硼酸钡（BBO） KTP(磷酸氧钛钾)激光晶体 Wafer

(钆镓石榴石GGG) (钇铝石榴石YAG) 钒酸钇(YVO4) 钒酸钆（YVO4） 磷酸氧钛钾（KTP） 三硼酸锂（LBO） 偏硼酸钡（BBO） KTP(磷酸氧钛钾)激光晶体 Wafer

Contact info

Specification for (钆镓石榴石GGG) (钇铝石榴石YAG) 钒酸钇(YVO4) 钒酸钆（YVO4） 磷酸氧钛钾（KTP） 三硼酸锂（LBO） 偏硼酸钡（BBO） KTP(磷酸氧钛钾)激光晶体 Wafer

(钆镓石榴石GGG) (钇铝石榴石YAG) 钒酸钇(YVO4) 钒酸钆（YVO4）磷酸氧钛钾（KTP）三硼酸锂（LBO）偏硼酸钡（BBO） KTP(磷酸氧钛钾)激光晶体 Wafer

Specification for (钆镓石榴石GGG) (钇铝石榴石YAG) 钒酸钇(YVO4) 钒酸钆（YVO4）磷酸氧钛钾（KTP）三硼酸锂（LBO）偏硼酸钡（BBO） KTP(磷酸氧钛钾)激光晶体 Wafer